Iksan-si, South Korea

Jinkyu Roh

This inventor holds 1 USPTO granted patent. Top assignees: Dongwoo Fine-Chem, Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jinkyu Roh. Retrieved from https://idiyas.com/inventor/jinkyu-roh-hsot5lmr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jinkyu Roh: Innovator in Etchant Composition Technology

Introduction

Jinkyu Roh is a notable inventor based in Iksan-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of etchant compositions.

Latest Patents

Jinkyu Roh holds a patent for an etchant composition designed for etching silicon and silicon germanium. The patent, titled "Etchant composition for etching silicon and silicon germanium, and preparation method of pattern using the same," outlines a composition that includes an oxidizing agent, a fluorine-based compound, a surfactant, and water. The surfactant is specified to be present in an amount ranging from 5% to 40% by weight based on the total weight of the etchant composition. This innovation is crucial for enhancing the efficiency and effectiveness of semiconductor patterning processes.

Career Highlights

Throughout his career, Jinkyu Roh has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Ltd. and Dongwoo Fine-Chem, where he has applied his expertise in etchant compositions and semiconductor technologies.

Collaborations

Jinkyu Roh has collaborated with notable professionals in his field, including Heesuk Woo and Kyusang Ahn. Their joint efforts have contributed to advancements in semiconductor manufacturing techniques.

Conclusion

Jinkyu Roh's innovative work in etchant compositions has positioned him as a key figure in the semiconductor industry. His contributions continue to influence the development of efficient manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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