The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Jun. 15, 2023
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Nireekshan K. Reddy, Tel Aviv, IL;

Arvind Jayaraman, New Hudson, MI (US);

Stilian Ivanov Pandev, Santa Clara, CA (US);

Amnon Manassen, Haifa, IL;

Boaz Ophir, Haifa, IL;

Udi Shusterman, Ramat Rachel, IL;

Nadav Gutman, Zichron Ya′aqov, IL;

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/706841 (2023.05);
Abstract

One or more optical images of a portion of a semiconductor wafer are obtained. The one or more optical images show a first structure in a first process layer and a second structure in a second process layer. The one or more optical images are provided to a machine-learning model trained to estimate an overlay offset between the first structure and the second structure. An estimated overlay offset between the first structure and the second structure is obtained from the machine-learning model.


Find Patent Forward Citations

Reddy, Nireekshan. (2026). Overlay estimation based on optical inspection and machine learning (U.S. Patent No. 12535744). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12535744

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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