Ramat Rachel, Israel

Udi Shusterman

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022-2023

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2 patents (USPTO):Explore Patents

Title: Udi Shusterman: Innovator in Machine Learning for Metrology

Introduction

Udi Shusterman is a prominent inventor based in Ramat Rachel, Israel. He has made significant contributions to the field of metrology through his innovative use of machine learning algorithms. With a total of two patents to his name, Shusterman is recognized for his advancements in improving metrology accuracy and process throughput.

Latest Patents

Shusterman's latest patents focus on machine learning for metrology measurements. These patents provide methods, modules, and systems that utilize machine learning algorithms to enhance metrology accuracy. The methods involve calculating training data from initial metrology measurements and applying machine learning algorithms to derive estimation models for metrology metrics. By deriving measurement data from images of sites on received wafers, the estimation model can provide accurate estimations of metrology metrics. Notably, while the training data may use two images per site, a single image per site can suffice in operation, significantly reducing measurement time. Additionally, confidence scores can be derived for enhanced metrology and process control, with deep learning techniques further improving accuracy and speed.

Career Highlights

Udi Shusterman is currently employed at Kla Corporation, where he continues to develop innovative solutions in metrology. His work has positioned him as a key figure in the integration of machine learning within this field.

Collaborations

Shusterman collaborates with notable colleagues, including Boaz Ophir and Yehuda Odes, contributing to a dynamic and innovative work environment.

Conclusion

Udi Shusterman's contributions to machine learning in metrology exemplify the intersection of technology and precision measurement. His patents reflect a commitment to advancing the field and improving processes through innovative solutions.

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