The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Feb. 02, 2021
Lam Research Corporation, Fremont, CA (US);
John Holland, San Jose, CA (US);
Stephan K. Piotrowski, San Jose, CA (US);
Jaewon Kim, Fremont, CA (US);
Pratik Mankidy, Fremont, CA (US);
Takumi Yanagawa, Fremont, CA (US);
Dongjun Wu, San Jose, CA (US);
Anthony De La Llera, Fremont, CA (US);
Zehua Jin, Houston, TX (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A plasma lining structure is used in a process chamber to block direct line-of-sight for plasma generated within to grounded surface. The plasma lining structure includes a plurality of sections to cover at least one or more portions of an inside surface of a plasma confinement structure disposed in the process chamber. The sections of the plasma lining structure are positioned between a plasma region and the sidewall of the plasma confinement structure, when the plasma lining structure and the plasma confinement structure are disposed in the plasma chamber, such that the sections directly face the plasma region.