Zehua Jin

Title: Zehua Jin: Innovator in Plasma Technology

Introduction

Zehua Jin is a prominent inventor based in Houston, TX (US). He has made significant contributions to the field of plasma technology, particularly in the area of plasma confinement structures. His innovative work has led to the development of a unique patent that addresses critical challenges in plasma processing.

Latest Patents

Zehua Jin holds a patent titled "Tunability of edge plasma density for tilt control." This patent describes a plasma lining structure used in a process chamber to block direct line-of-sight for plasma generated within to grounded surfaces. The plasma lining structure includes multiple sections designed to cover various portions of the inside surface of a plasma confinement structure. These sections are strategically positioned between the plasma region and the sidewall of the plasma confinement structure, ensuring they directly face the plasma region when installed in the plasma chamber.

Career Highlights

Zehua Jin is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to focus on advancing plasma technology and its applications in semiconductor manufacturing. With a patent portfolio that includes 1 patent, he continues to push the boundaries of innovation in his field.

Collaborations

Zehua Jin collaborates with various professionals in his field, including his coworker, Stephan K. Piotrowski. Their combined expertise contributes to the ongoing development of cutting-edge technologies in plasma processing.

Conclusion

Zehua Jin's contributions to plasma technology exemplify the spirit of innovation and dedication to advancing scientific knowledge. His work not only enhances the efficiency of plasma processes but also paves the way for future advancements in the semiconductor industry.