Fremont, CA, United States of America

Jaewon Kim



Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jaewon Kim: Innovator in Plasma Technology

Introduction

Jaewon Kim is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of plasma technology, particularly in the area of plasma confinement structures. His innovative work has led to the development of a unique patent that addresses critical challenges in plasma processing.

Latest Patents

Jaewon Kim holds a patent titled "Tunability of edge plasma density for tilt control." This patent describes a plasma lining structure used in a process chamber to block direct line-of-sight for plasma generated within to grounded surfaces. The plasma lining structure includes multiple sections designed to cover various portions of the inside surface of a plasma confinement structure. These sections are strategically positioned between the plasma region and the sidewall of the plasma confinement structure, ensuring they directly face the plasma region when installed in the plasma chamber. This innovative design enhances the control and efficiency of plasma processing.

Career Highlights

Jaewon Kim is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his expertise in plasma technology to develop advanced solutions for semiconductor manufacturing. His contributions have been instrumental in improving the performance and reliability of plasma processing equipment.

Collaborations

Jaewon Kim collaborates with several professionals in his field, including his coworker, Stephan K. Piotrowski. Together, they work on innovative projects that push the boundaries of plasma technology and its applications in various industries.

Conclusion

Jaewon Kim is a distinguished inventor whose work in plasma technology has led to significant advancements in the field. His patent on the tunability of edge plasma density showcases his innovative approach to solving complex challenges in plasma processing. His contributions at Lam Research Corporation continue to impact the semiconductor industry positively.

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