San Jose, CA, United States of America

Stephan K Piotrowski


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Stephan K. Piotrowski

Introduction

Stephan K. Piotrowski is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of plasma technology, particularly in the area of plasma confinement structures. His innovative work has led to the development of a unique patent that addresses critical challenges in plasma processing.

Latest Patents

Stephan holds a patent titled "Tunability of edge plasma density for tilt control." This invention involves a plasma lining structure used in a process chamber to block direct line-of-sight for plasma generated within to grounded surfaces. The plasma lining structure consists of multiple sections designed to cover various portions of the inside surface of a plasma confinement structure. These sections are strategically positioned between the plasma region and the sidewall of the plasma confinement structure, ensuring they directly face the plasma region when installed in the plasma chamber.

Career Highlights

Stephan K. Piotrowski is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to explore and innovate within the realm of plasma technology, contributing to advancements that enhance manufacturing processes.

Collaborations

One of his notable coworkers is Jaewon Kim, with whom he collaborates on various projects related to plasma technology and its applications in semiconductor manufacturing.

Conclusion

Stephan K. Piotrowski's contributions to plasma technology through his patent and work at Lam Research Corporation highlight his role as an influential inventor in the field. His innovative approaches continue to shape advancements in semiconductor manufacturing processes.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…