The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Apr. 22, 2022
Applicant:
C. Uyemura & Co., Ltd., Osaka, JP;
Inventors:
Takuya Komeda, Osaka, JP;
Tetsuji Ishida, Osaka, JP;
Hisamitsu Yamamoto, Osaka, JP;
Kazunari Kato, Osaka, JP;
Ryoyu Shimizu, Osaka, JP;
Assignee:
C. Uyemura & Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/18 (2006.01);
U.S. Cl.
CPC ...
C23F 1/18 (2013.01);
Abstract
A copper etching solution contains an oxidizing agent and an amine compound. The oxidizing agent is one or more selected from the group consisting of a perchlorate, a chlorate, a chlorite, a hypochlorite, hydrogen peroxide, and a perborate, and the amine compound has one or more primary amino groups or secondary amino groups.
Komeda, Takuya. (2025). Copper etching solution (U.S. Patent No. 12503775). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12503775
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile