Kazunari Kato

Title: Kazunari Kato: Innovator in Copper Electrolytic Plating Technology

Introduction

Kazunari Kato is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of electroplating, particularly in the development of copper electrolytic plating technologies. His innovative work has led to advancements that enhance the physical properties of plating films.

Latest Patents

Kazunari Kato holds 1 patent for his invention titled "Copper electrolytic plating bath and copper electrolytic plating film." This invention provides a technology that allows for the creation of a copper electrolytic plating film with significantly suppressed co-deposition of sulfur. The resulting film exhibits excellent physical properties, such as strength and hardness, even after high-temperature heat treatment at around 200°C or higher. The copper electrolytic plating bath includes copper ions, an acid, chloride ions, and a complexing agent, with silver ions incorporated as an alloy component.

Career Highlights

Kato is associated with Cuyemura Co., Ltd., where he continues to develop and refine his innovative technologies. His work has been instrumental in advancing the capabilities of copper plating processes, making them more efficient and effective.

Collaborations

Kazunari Kato has collaborated with notable colleagues, including Naoyuki Omura and Yuki Itakura. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Kazunari Kato's contributions to copper electrolytic plating technology exemplify the impact of innovation in industrial applications. His work not only enhances the quality of plating films but also sets a standard for future advancements in the field.