Osaka, Japan

Ryoyu Shimizu

This inventor holds 2 USPTO granted patents. Top assignees: C. Uyemura & Co., Ltd., C. Uyemura & Co., Ltd.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryoyu Shimizu. Retrieved from https://idiyas.com/inventor/ryoyu-shimizu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Ryoyu Shimizu: Innovator in Electroless Plating Technologies

Introduction

Ryoyu Shimizu is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of electroless plating, holding 2 patents that enhance the efficiency and effectiveness of this technology. His work focuses on improving pretreatment methods and solutions for electroless plating processes.

Latest Patents

Shimizu's latest patents include a pretreatment method for electroless plating and a pretreatment solution for electroless plating. The purpose of these inventions is to increase the adsorption amount of a catalyst on substrates during the electroless plating process. The pretreatment method involves several steps, including a cleaner process, soft etching, and catalyst imparting and reducing processes. Anionic surfactants are utilized to enhance the treatment solution, which ultimately improves the adhesion of the ionic catalyst to the substrate.

Career Highlights

Throughout his career, Ryoyu Shimizu has worked with C. Uyemura & Co., Ltd., where he has applied his expertise in plating technologies. His innovative approaches have contributed to advancements in the industry, particularly in the area of copper etching solutions.

Collaborations

Shimizu has collaborated with notable coworkers such as Tetsuji Ishida and Hisamitsu Yamamoto. Their combined efforts have furthered the development of effective electroless plating techniques.

Conclusion

Ryoyu Shimizu's contributions to electroless plating technologies demonstrate his commitment to innovation in the field. His patents reflect a deep understanding of the processes involved and a desire to enhance the efficiency of plating methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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