The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Mar. 21, 2023
Entegris, Inc., Billerica, MA (US);
Volley Wang, Zhubei, TW;
Atanu K. Das, Southbury, CT (US);
Michael L. White, Ridgefield, CT (US);
Chun-I Lee, Zhubei, TW;
Nilesh Gunda, North Chelmsford, MA (US);
Daniela White, Ridgefield, CT (US);
Donald Frye, Sherman, CT (US);
ENTEGRIS, INC., Billerica, MA (US);
Abstract
The invention provides compositions useful in post-CMP cleaning operations where ceria is present. In one aspect, the invention provides a composition comprising a reducing agent; a chelating agent; an amino(C-Calkyl)alcohol; and water; wherein the composition has a pH of less than about 8. The compositions of the invention were found to show improved ceria removal on, for example, poly silicon (poly Si) substrates. Also provided is a method for cleaning a microelectronic device substrate using such compositions and a kit comprising, in one or more containers, selected components of the compositions.