Company Filing History:
Years Active: 2025
Title: Volley Wang - Innovator in Post CMP Cleaning Compositions
Introduction
Volley Wang is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of microelectronics, particularly in the area of cleaning compositions used in post-CMP (Chemical Mechanical Planarization) operations. His innovative work has implications for improving the efficiency and effectiveness of cleaning processes in semiconductor manufacturing.
Latest Patents
Volley Wang holds 1 patent for his invention titled "Post CMP cleaning composition." This invention provides compositions that are useful in post-CMP cleaning operations where ceria is present. The composition includes a reducing agent, a chelating agent, an amino(C-Calkyl)alcohol, and water, with a pH of less than about 8. The compositions have been found to show improved ceria removal on poly silicon (poly Si) substrates. Additionally, the invention includes a method for cleaning a microelectronic device substrate using these compositions and a kit comprising selected components of the compositions.
Career Highlights
Volley Wang is currently associated with Entegris, Inc., a company known for its advanced materials and solutions for the semiconductor industry. His work at Entegris has allowed him to focus on developing innovative cleaning solutions that enhance the performance of microelectronic devices.
Conclusion
Volley Wang's contributions to the field of microelectronics through his innovative cleaning compositions demonstrate his commitment to advancing technology in semiconductor manufacturing. His patent reflects a significant step forward in improving cleaning processes, which is crucial for the efficiency of microelectronic devices.