Chun-I Lee

Title: Innovations by Chun-I Lee

Introduction

Chun-I Lee is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of microelectronics, particularly in cleaning compositions used in semiconductor manufacturing. His work focuses on improving the efficiency of post-CMP (Chemical Mechanical Planarization) cleaning processes.

Latest Patents

Chun-I Lee holds 1 patent for his invention titled "Post CMP cleaning composition." This innovative composition is designed for use in post-CMP cleaning operations where ceria is present. The composition includes a reducing agent, a chelating agent, an amino(C-Calkyl)alcohol, and water, with a pH of less than about 8. The invention has demonstrated improved ceria removal on poly silicon (poly Si) substrates, which is crucial for the performance of microelectronic devices. Additionally, the patent outlines a method for cleaning microelectronic device substrates using these compositions, along with a kit containing selected components.

Career Highlights

Chun-I Lee is currently employed at Entegris, Inc., a company known for its advanced materials and solutions for the semiconductor industry. His role involves research and development, where he applies his expertise to create innovative cleaning solutions that enhance manufacturing processes.

Collaborations

Chun-I Lee collaborates with various professionals in the field, including his coworker, Volley Wang. Their combined efforts contribute to the advancement of technologies in microelectronics and semiconductor manufacturing.

Conclusion

Chun-I Lee's contributions to the field of microelectronics through his innovative cleaning compositions highlight the importance of research and development in enhancing manufacturing processes. His work continues to impact the semiconductor industry positively.