The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Sep. 24, 2021
Intel Corporation, Santa Clara, CA (US);
Yoshihiro Tomita, Tsukuba, JP;
Aleksandar Aleksov, Chandler, AZ (US);
Feras Eid, Chandler, AZ (US);
Adel Elsherbini, Chandler, AZ (US);
Wenhao Li, Chandler, AZ (US);
Stephen Morein, San Jose, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Technologies for high throughput additive manufacturing (HTAM) structures are disclosed. In one embodiment, a sacrificial dielectric is formed to provide a negative mask on which to pattern a conductive trace using HTAM. In another embodiment, a permanent dielectric is patterned using a processing such as laser project patterning. A conductive trace can then be patterned using HTAM. In yet another embodiment, conductive traces with tapered sidewalls can be patterned, and then a buffer layer and HTAM layer can be deposited on top.