Wenhao Li

Title: Innovations of Inventor Wenhao Li

Introduction

Wenhao Li is a prominent inventor based in Chandler, AZ (US). He has made significant contributions to the field of additive manufacturing, particularly in the context of integrated circuit components. With a total of 2 patents, his work is paving the way for advancements in technology.

Latest Patents

Wenhao Li's latest patents focus on high throughput additive manufacturing (HTAM) for integrated circuit components. One of his patents describes a method where a sacrificial dielectric is formed to create a negative mask for patterning conductive traces using HTAM. Another embodiment involves the use of a permanent dielectric that is patterned through processes such as laser project patterning. Additionally, he has developed techniques for patterning conductive traces with tapered sidewalls, followed by the deposition of a buffer layer and HTAM layer on top. These innovations are crucial for enhancing the efficiency and effectiveness of manufacturing processes in the electronics industry.

Career Highlights

Wenhao Li is currently employed at Intel Corporation, where he continues to push the boundaries of technology through his innovative work. His expertise in high throughput additive manufacturing has positioned him as a key player in the development of advanced manufacturing techniques.

Collaborations

Wenhao has collaborated with notable colleagues such as Yoshihiro Tomita and Aleksandar Aleksov. Their combined efforts contribute to the advancement of technologies in the field of additive manufacturing.

Conclusion

Wenhao Li's contributions to high throughput additive manufacturing are noteworthy and reflect his dedication to innovation. His patents and work at Intel Corporation are instrumental in shaping the future of integrated circuit manufacturing.