The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Jun. 01, 2023
Applicant:

Asmpt Singapore Pte. Ltd., Singapore, SG;

Inventors:

Jun Qi, Hong Kong, CN;

Hao Meng, Chengdu, CN;

Zheng Chen, Chengdu, CN;

Yi Dong Du, Chengdu, CN;

Li Dong He, Chengdu, CN;

Assignee:

ASMPT SINGAPORE PTE. LTD., Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H05H 1/2406 (2013.01); H05H 2242/10 (2013.01);
Abstract

A dielectric barrier discharge plasma generator includes a ground electrode and a high voltage electrode which are configured to form a circuit to receive a power input for plasma generation, a dielectric barrier having a first surface attached to the high voltage electrode, and a second surface facing the ground electrode, and discharge gap being formed between the second surface of the dielectric barrier and the ground electrode for plasma generation, and a resiliently deformable mechanism operative to bias the high voltage electrode against the first surface of the dielectric barrier.


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