Yi Dong Du

Title: Yi Dong Du: Innovator in Dielectric Barrier Discharge Plasma Technology

Introduction

Yi Dong Du is a prominent inventor based in Chengdu, China. He has made significant contributions to the field of plasma technology, particularly with his innovative designs and patents. His work focuses on enhancing the efficiency and functionality of plasma generators.

Latest Patents

Yi Dong Du holds a patent for a Dielectric Barrier Discharge Plasma Generator. This invention includes a ground electrode and a high voltage electrode configured to form a circuit for plasma generation. The design features a dielectric barrier with a first surface attached to the high voltage electrode and a second surface facing the ground electrode. A discharge gap is formed between the second surface of the dielectric barrier and the ground electrode, facilitating plasma generation. Additionally, a resiliently deformable mechanism is incorporated to bias the high voltage electrode against the first surface of the dielectric barrier. This innovative approach enhances the performance of plasma generators.

Career Highlights

Yi Dong Du is currently employed at Asmpt Singapore Pte. Ltd., where he continues to develop cutting-edge technologies in plasma generation. His expertise and innovative mindset have positioned him as a valuable asset in his field.

Collaborations

Yi Dong Du collaborates with talented coworkers, including Jun Qi and Hao Meng. Their combined efforts contribute to advancing research and development in plasma technology.

Conclusion

Yi Dong Du's contributions to dielectric barrier discharge plasma technology exemplify his innovative spirit and dedication to advancing scientific knowledge. His patent and ongoing work at Asmpt Singapore Pte. Ltd. highlight his role as a key figure in the field.