Chengdu, China

Li Dong He


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):

Title: Innovations of Li Dong He in Plasma Technology

Introduction

Li Dong He is a notable inventor based in Chengdu, China. He has made significant contributions to the field of plasma technology, particularly with his innovative designs and patents. His work has implications for various applications, showcasing the potential of dielectric barrier discharge systems.

Latest Patents

Li Dong He holds a patent for a Dielectric Barrier Discharge Plasma Generator. This invention includes a ground electrode and a high voltage electrode configured to form a circuit for plasma generation. The design features a dielectric barrier with a first surface attached to the high voltage electrode and a second surface facing the ground electrode. A discharge gap is formed between the second surface of the dielectric barrier and the ground electrode, facilitating plasma generation. Additionally, a resiliently deformable mechanism is included to bias the high voltage electrode against the first surface of the dielectric barrier. This innovative approach enhances the efficiency and effectiveness of plasma generation.

Career Highlights

Li Dong He is currently employed at Asmpt Singapore Pte. Ltd., where he continues to develop and refine his inventions. His work at the company has allowed him to collaborate with other talented individuals in the field, further advancing the technology related to plasma generation.

Collaborations

Li has worked alongside colleagues such as Jun Qi and Hao Meng, contributing to a collaborative environment that fosters innovation and creativity. Their combined expertise has led to advancements in the applications of plasma technology.

Conclusion

Li Dong He is a prominent inventor whose work in dielectric barrier discharge plasma technology has made a significant impact. His innovative designs and collaborative efforts continue to push the boundaries of what is possible in this field.

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