Hao Meng

Title: Hao Meng - Innovator in Dielectric Barrier Discharge Plasma Technology

Introduction

Hao Meng is a prominent inventor based in Chengdu, China. He has made significant contributions to the field of plasma technology, particularly with his innovative designs and patents. His work focuses on enhancing the efficiency and functionality of plasma generation systems.

Latest Patents

Hao Meng holds a patent for a Dielectric Barrier Discharge Plasma Generator. This invention includes a ground electrode and a high voltage electrode configured to form a circuit for plasma generation. The design features a dielectric barrier with a first surface attached to the high voltage electrode and a second surface facing the ground electrode. A discharge gap is formed between the second surface of the dielectric barrier and the ground electrode, facilitating plasma generation. Additionally, a resiliently deformable mechanism is incorporated to bias the high voltage electrode against the first surface of the dielectric barrier. This innovative approach enhances the performance of plasma generators.

Career Highlights

Hao Meng is currently employed at Asmpt Singapore Pte. Ltd., where he continues to develop cutting-edge technologies in plasma generation. His expertise and innovative mindset have positioned him as a valuable asset in his field.

Collaborations

Hao has collaborated with notable colleagues, including Jun Qi and Zheng Chen, who share his passion for advancing plasma technology. Their combined efforts contribute to the ongoing development of innovative solutions in this area.

Conclusion

Hao Meng's contributions to dielectric barrier discharge plasma technology exemplify his commitment to innovation and excellence. His patent and ongoing work at Asmpt Singapore Pte. Ltd. highlight his role as a leading inventor in the field.