The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
May. 28, 2021
Rohm and Haas Electronic Materials Korea Ltd., Cheonan-si, KR;
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Jung June Lee, Hwaseong-si, KR;
Jae Hwan Sim, Hwaseong-si, KR;
Suwoong Kim, Hwaseong-si, KR;
Jin Hong Park, Hwaseong-si, KR;
Bhooshan Popere, Sturbridge, MA (US);
DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC, Marlborough, MA (US);
DUPONT SPECIALTY MATERIALS KOREA LTD, Chungcheongnam-Do, KR;
Abstract
A photoresist underlayer composition, comprising: a first polymer comprising a crosslinkable group; a second polymer comprising: a first repeating unit comprising a repeating unit comprising a photoacid generator, and a second repeating unit comprising a hydroxy-substituted Calkyl group, a hydroxy-substituted Ccycloalkyl group, or a hydroxy-substituted Caryl group; an acid catalyst; and a solvent.