Company Filing History:
1 out of 10 
1 out of 24 Years Active: 2025
Title: Bhooshan Popere: Innovator in Photoresist Technology
Introduction
Bhooshan Popere is a notable inventor based in Sturbridge, MA (US). He has made significant contributions to the field of photoresist technology, particularly with his innovative patent that enhances the performance of photoresist underlayers.
Latest Patents
Bhooshan Popere holds a patent for a composition for photoresist underlayer. This composition includes a first polymer with a crosslinkable group, a second polymer that contains a photoacid generator and a hydroxy-substituted alkyl, cycloalkyl, or aryl group, an acid catalyst, and a solvent. This invention aims to improve the efficiency and effectiveness of photoresist applications in various technologies.
Career Highlights
Throughout his career, Bhooshan has worked with prominent companies in the industry. He has been associated with DuPont Electronic Materials International, LLC and DuPont Specialty Materials Korea Ltd. His experience in these organizations has allowed him to develop and refine his expertise in materials science and engineering.
Collaborations
Bhooshan has collaborated with talented professionals in his field, including Jung June Lee and Jae Hwan Sim. These collaborations have contributed to the advancement of his research and innovations.
Conclusion
Bhooshan Popere is a distinguished inventor whose work in photoresist technology has made a significant impact. His patent and career achievements reflect his dedication to innovation and excellence in the field.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.