Jung June Lee

Title: Innovations of Jung June Lee

Introduction

Jung June Lee is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of electronic materials, holding a total of three patents. His work primarily focuses on compositions for photoresist underlayers, which are crucial in the manufacturing of semiconductors.

Latest Patents

Jung June Lee's latest patents include a "Composition for Photoresist Underlayer" and a "Coating Composition for Photoresist Underlayer." The first patent describes a photoresist underlayer composition that includes a first polymer with a crosslinkable group, a second polymer with specific repeating units, an acid catalyst, and a solvent. The second patent outlines a coating composition that features a crosslinkable polyester polymer with an isocyanurate group, a crosslinker, and an acid catalyst, where at least one component contains an iodine-containing polymer.

Career Highlights

Throughout his career, Jung June Lee has worked with prominent companies in the electronic materials sector. He has been associated with Rohm and Haas Electronic Materials Korea Ltd. and DuPont Electronic Materials International, LLC. His expertise in the field has allowed him to develop innovative solutions that enhance the performance of electronic components.

Collaborations

Jung June Lee has collaborated with talented individuals such as Suwoong Kim and Jin Hong Park. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Jung June Lee's contributions to the field of electronic materials through his innovative patents and collaborations highlight his role as a significant inventor. His work continues to impact the semiconductor industry positively.