Jae Hwan Sim

Title: Innovations by Jae Hwan Sim

Introduction

Jae Hwan Sim is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of photoresist compositions. With a total of 2 patents, his work has implications for advanced lithography processes.

Latest Patents

One of his latest patents is a composition for a photoresist underlayer. This composition includes a first polymer with a crosslinkable group and a second polymer that contains a photoacid generator and various hydroxy-substituted groups. Additionally, it incorporates an acid catalyst and a solvent. Another significant patent is a coating composition for forming a resist underlayer film specifically designed for the EUV lithography process. This patent details a monomer represented by a specific chemical formula, which includes repeat units derived from the monomer.

Career Highlights

Jae Hwan Sim has worked with prominent companies in the industry, including DuPont Specialty Materials Korea Ltd. and DuPont Electronic Materials International, LLC. His experience in these organizations has allowed him to refine his expertise in materials used for electronic applications.

Collaborations

Throughout his career, Jae Hwan Sim has collaborated with talented individuals such as Suwoong Kim and Jin Hong Park. These collaborations have contributed to the advancement of his research and innovations.

Conclusion

Jae Hwan Sim's contributions to the field of materials science, particularly in photoresist compositions, highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving lithography processes, making him a significant figure in his field.