Jin Hong Park

Title: Jin Hong Park: Innovator in Photoresist Technology

Introduction

Jin Hong Park is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of photoresist technology, holding a total of 2 patents. His work focuses on developing advanced materials for lithography processes, which are essential in the semiconductor industry.

Latest Patents

Among his latest patents is a composition for a photoresist underlayer. This innovative composition includes a first polymer with a crosslinkable group and a second polymer that features a photoacid generator and various hydroxy-substituted groups. Additionally, he has developed a coating composition for forming resist underlayer films specifically for EUV lithography processes. This patent involves a monomer represented by a specific chemical formula, which contributes to the polymer's unique properties.

Career Highlights

Jin Hong Park has worked with prominent companies in the industry, including DuPont Specialty Materials Korea Ltd. and DuPont Electronic Materials International, LLC. His experience in these organizations has allowed him to refine his expertise in materials science and innovation.

Collaborations

Throughout his career, Jin Hong Park has collaborated with talented individuals such as Jae Hwan Sim and Suwoong Kim. These partnerships have fostered a creative environment that has led to groundbreaking advancements in photoresist technology.

Conclusion

Jin Hong Park's contributions to the field of photoresist technology are noteworthy, and his patents reflect his innovative spirit. His work continues to influence the semiconductor industry, paving the way for future advancements.