The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Dec. 15, 2022
Shanghai Institute of Measurement and Testing Technology, Shanghai, CN;
Tongji University, Shanghai, CN;
Lihua Lei, Shanghai, CN;
Chengming Cao, Shanghai, CN;
Yingfan Xiong, Shanghai, CN;
Zhangning Xie, Shanghai, CN;
Xiao Deng, Shanghai, CN;
Xinbin Cheng, Shanghai, CN;
Yuqing Guan, Shanghai, CN;
Wenzhe Zou, Shanghai, CN;
Yunxia Fu, Shanghai, CN;
Shanghai Institute of Measurement and Testing Technology, Shanghai, CN;
Tongji University, Shanghai, CN;
Abstract
The present application discloses a method for calibrating a parameter error of an electron probe microanalysis instrument. A one-dimensional grating standard template is prepared based on atom lithography technology. A theoretical grating period D of the one-dimensional grating standard template is calculated. The one-dimensional grating standard template is statically placed on a stage of the electron probe microanalysis instrument. The electron probe microanalysis instrument scans the one-dimensional grating standard template on the stage, performs image acquisition and measurement on a grid distance of the one-dimensional grating standard template to obtain a grating scanning distance measurement value L, and records a magnification ratio at this time. A calibration factor K under the magnification ratio is calculated according to D and L. The present application shortens the length of the traceability chain for calibrating the instrument, reduces the error accumulation in the quantity value dissemination process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile