The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2025

Filed:

Aug. 19, 2021
Applicant:

Peking University, Beijing, CN;

Inventors:

Lu Zhang, Beijing, CN;

Yiling Lou, Beijing, CN;

Qihao Zhu, Beijing, CN;

Jinhao Dong, Beijing, CN;

Zeyu Sun, Beijing, CN;

Dan Hao, Beijing, CN;

Assignee:

Peking University, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2018.12); G06N 3/04 (2022.12);
U.S. Cl.
CPC ...
G06N 3/04 (2012.12); G06N 20/00 (2018.12);
Abstract

The present disclosure discloses a defect location method and device based on coverage information, the method including: characterizing program structure information and test case coverage information of a target program in a graph to obtain a graph-characterized structure; generating a node attribute sequence and an adjacency matrix based on the graph-characterized structure; and inputting the node attribute sequence and the adjacency matrix to a trained graph neural network model, so that the graph neural network model outputs a suspicious degree list of the target program based on the node attribute sequence and the adjacency matrix. Through the graph-based unified information characterization, the coverage information can be saved without loss and compression, and the structure information may also be considered, thereby improving the accuracy of defect location.


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