The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

Nov. 22, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Meng-Sheng Chang, Chubei, TW;

Chia-En Huang, Xinfeng Township, TW;

Chun Chung Su, New Taipei, TW;

Wen-Hsing Hsieh, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/41 (2006.01); G11C 11/402 (2006.01); G11C 17/12 (2006.01); G11C 17/16 (2006.01); H01L 23/00 (2006.01); H10B 20/00 (2023.01); H10B 20/25 (2023.01);
U.S. Cl.
CPC ...
H01L 29/413 (2013.01); G11C 17/12 (2013.01); G11C 17/123 (2013.01); G11C 17/16 (2013.01); G11C 17/165 (2013.01); H10B 20/25 (2023.02); H10B 20/30 (2023.02); H10B 20/367 (2023.02); H10B 20/60 (2023.02); G11C 11/4023 (2013.01); H01L 23/573 (2013.01);
Abstract

A semiconductor device includes first nanostructures vertically separated from one another, a first gate structure wrapping around each of the first nanostructures, and second nanostructures vertically separated from one another. The semiconductor device also includes a second gate structure wrapping around the second nanostructures, a first drain/source structure coupled to a first end of the first nanostructures, a second drain/source structure coupled to both of a second end of the first nanostructures and a first end of the second nanostructures, and a third drain/source structure coupled to a second end of the second nanostructures. The first drain/source structure has a first doping type, the second and third drain/source structures have a second doping type, and the first doping type is opposite to the second doping type.


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