The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2025
Filed:
Oct. 27, 2022
Asm Ip Holding, B.v., Almere, NL;
Viraj Madhiwala, Helsinki, FI;
Daniele Chiappe, Espoo, FI;
Eva Tois, Espoo, FI;
Marko Tuominen, Helsinki, FI;
Charles Dezelah, Helsinki, FI;
Shaoren Deng, Ghent, BE;
Anirudhan Chandrasekaran, Scottsdale, AZ (US);
YongGyu Han, Seoul, KR;
Michael Givens, Oud-Heverlee, BE;
Andrea Illiberi, Leuven, BE;
Vincent Vandalon, Heverlee, BE;
ASM IP Holding B.V., Almere, NL;
Abstract
Methods and vapor deposition assemblies of selectively depositing material comprising silicon and oxygen on a first surface of a substrate relative to a second surface of the substrate by a cyclic deposition process are disclosed. The methods comprise providing a substrate into a reaction chamber, providing a metal or metalloid catalyst into the reaction chamber in a vapor phase, providing a silicon precursor comprising an alkoxy silane compound into the reaction chamber in a vapor phase and providing a plasma into the reaction chamber to form a reactive species for forming a material comprising silicon and oxygen on the first surface. The methods may comprise subcycles for, for example, adjusting the proportions of material components.