The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Aug. 25, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Feihu Wang, San Jose, CA (US);
Joung Joo Lee, San Jose, CA (US);
Xi Cen, San Jose, CA (US);
Zhibo Yuan, Santa Clara, CA (US);
Wei Lei, Campbell, CA (US);
Kai Wu, Palo Alto, CA (US);
Chunming Zhou, Fremont, CA (US);
Zhebo Chen, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/285 (2006.01); H01L 23/532 (2006.01); H01L 21/02 (2006.01); H01L 23/528 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76843 (2013.01); H01L 21/2855 (2013.01); H01L 21/28556 (2013.01); H01L 21/76876 (2013.01); H01L 21/76877 (2013.01); H01L 23/53266 (2013.01); H01L 21/02068 (2013.01); H01L 23/5283 (2013.01);
Abstract
Apparatus and methods to provide electronic devices comprising tungsten film stacks are provided. A tungsten liner formed by physical vapor deposition is filled with a tungsten film formed by chemical vapor deposition directly over the tungsten liner.