Zhibo Yuan

Title: Zhibo Yuan: Innovator in Semiconductor Technology

Introduction

Zhibo Yuan is a prominent inventor based in Santa Clara, California, known for his contributions to semiconductor technology. With a total of two patents to his name, Yuan has made significant advancements in the field, particularly in the manufacturing processes of tungsten films and semiconductor structures.

Latest Patents

Yuan's latest patents include a method for creating low resistivity tungsten films. This innovation involves an apparatus and methods to provide electronic devices that comprise tungsten film stacks. The process features a tungsten liner formed by physical vapor deposition, which is then filled with a tungsten film created by chemical vapor deposition directly over the tungsten liner. Another notable patent is the dual silicide process using ruthenium silicide. This method describes the formation of semiconductor structures by patterning a substrate to create openings over n and p transistors. The process includes selectively depositing a ruthenium silicide layer on the p transistor and forming a titanium silicide layer on both transistors, all while maintaining vacuum in the processing chamber.

Career Highlights

Zhibo Yuan is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing industry. His work focuses on innovative solutions that enhance the performance and efficiency of electronic devices.

Collaborations

Yuan collaborates with talented professionals in his field, including coworkers Joung Joo Lee and Feihu Wang. Their combined expertise contributes to the advancement of semiconductor technologies and the development of new manufacturing techniques.

Conclusion

Zhibo Yuan's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of electronic devices.