The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2024
Filed:
Oct. 25, 2022
Tokyo Electron Limited, Tokyo, JP;
Sergey Voronin, Albany, NY (US);
Andrej Mitrovic, Chandler, AZ (US);
Blaze Messer, Albany, NY (US);
Yan Chen, Fremont, CA (US);
Joel Ng, Fremont, CA (US);
Ashawaraya Shalini, Fremont, CA (US);
Ying Zhu, Fremont, CA (US);
Da Song, Albany, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of processing a substrate that includes: exposing the substrate in a plasma processing chamber to a plasma powered by applying a first power to a first electrode of a plasma processing chamber; turning OFF the first power to the first electrode after the first time duration; while the first power is OFF, applying a second power to a second electrode of the plasma processing chamber for a second time duration, the second time duration being shorter than the first time duration, an energy of the second power over the second time duration is less than an energy of the first power over the first time duration by a factor of at least 2; and detecting an optical emission spectrum (OES) from species in the plasma processing chamber.