Fremont, CA, United States of America

Ashawaraya Shalini

USPTO Granted Patents = 3 

Average Co-Inventor Count = 7.3

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ashawaraya Shalini

Introduction

Ashawaraya Shalini is a prominent inventor based in Fremont, CA (US). She has made significant contributions to the field of plasma processing, holding a total of 3 patents. Her work focuses on advanced methods for optical emission spectroscopy and endpoint detection, which are crucial for enhancing plasma processing systems.

Latest Patents

One of her latest patents is titled "Method for OES data collection and endpoint detection." This innovative method involves processing a substrate in a plasma processing chamber by exposing it to plasma powered by a first electrode. The process includes determining a process endpoint while applying a second power to a second electrode, which is shorter in duration than the first. This method allows for obtaining an optical emission spectrum (OES) from the plasma, optimizing the processing efficiency.

Another notable patent is "Optical emission spectroscopy for advanced process characterization." This method characterizes a plasma in a processing system by generating a pulsed plasma powered with a pulsed power signal. The process includes performing cyclic OES measurements to obtain characteristics of the pulsed plasma, enhancing the understanding of plasma behavior during processing.

Career Highlights

Ashawaraya Shalini is currently employed at Tokyo Electron Limited, where she continues to innovate in the field of plasma processing. Her expertise and contributions have positioned her as a key figure in her organization, driving advancements in technology.

Collaborations

Throughout her career, Ashawaraya has collaborated with notable colleagues, including Sergey Alexandrovich Voronin and Blaze Messer. These collaborations have further enriched her work and contributed to the development of cutting-edge technologies in plasma processing.

Conclusion

Ashawaraya Shalini's innovative work in plasma processing and her impressive portfolio of patents highlight her significant impact on the field. Her contributions continue to advance technology and improve processes in the industry.

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