The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2024
Filed:
Sep. 27, 2021
International Business Machines Corporation, Armonk, NY (US);
Huimei Zhou, Albany, NY (US);
Julien Frougier, Albany, NY (US);
Xuefeng Liu, Schenectady, NY (US);
Jingyun Zhang, Albany, NY (US);
Lan Yu, Voorheesville, NY (US);
Heng Wu, Guilderland, NY (US);
Miaomiao Wang, Albany, NY (US);
Veeraraghavan S. Basker, Schenectady, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
In one embodiment a semiconductor structure comprises a semiconductor substrate, a trench dielectric layer disposed in a trench of the semiconductor substrate, a first source/drain region disposed in contact with the semiconductor substrate, a gate and a second source/drain region. The gate is disposed between the first source/drain region and the second source/drain region. The semiconductor structure further comprises a dielectric isolation layer disposed between the semiconductor substrate and the second source/drain region.