The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Jul. 25, 2022
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chih Wei Sung, Kaohsiung, TW;

Chung-Bin Tseng, Tainan, TW;

Keng-Ying Liao, Tainan, TW;

Yen-Jou Wu, Tainan, TW;

Po-Zen Chen, Tainan, TW;

Su-Yu Yeh, Tainan, TW;

Ching-Chung Su, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 23/544 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1876 (2013.01); H01L 23/544 (2013.01); H01L 27/14621 (2013.01); H01L 27/14627 (2013.01); H01L 27/14636 (2013.01); H01L 27/1464 (2013.01); H01L 27/14683 (2013.01); H01L 27/14687 (2013.01); H01L 31/186 (2013.01); H01L 31/1888 (2013.01); H01L 2223/54426 (2013.01);
Abstract

A method includes forming image sensors in a semiconductor substrate. A first alignment mark is formed close to a front side of the semiconductor substrate. The method further includes performing a backside polishing process to thin the semiconductor substrate, forming a second alignment mark on the backside of the semiconductor substrate, and forming a feature on the backside of the semiconductor substrate. The feature is formed using the second alignment mark for alignment.


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