The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Aug. 18, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Po-Hao Tsai, Zhongli, TW;

Techi Wong, Zhubei, TW;

Meng-Liang Lin, Hsinchu, TW;

Yi-Wen Wu, New Taipei, TW;

Po-Yao Chuang, Hsin-Chu, TW;

Shin-Puu Jeng, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01); H01L 23/00 (2006.01); H01L 23/31 (2006.01); H01L 23/495 (2006.01); H01L 23/498 (2006.01); H01L 23/538 (2006.01); H01L 25/00 (2006.01); H01L 25/065 (2023.01); H01L 25/07 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5283 (2013.01); H01L 23/3128 (2013.01); H01L 23/3185 (2013.01); H01L 23/49575 (2013.01); H01L 23/49861 (2013.01); H01L 23/5389 (2013.01); H01L 24/09 (2013.01); H01L 24/17 (2013.01); H01L 24/32 (2013.01); H01L 25/0657 (2013.01); H01L 25/074 (2013.01); H01L 25/50 (2013.01); H01L 2224/0231 (2013.01); H01L 2224/02373 (2013.01); H01L 2224/02379 (2013.01); H01L 2224/02381 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/3207 (2013.01); H01L 2224/32225 (2013.01); H01L 2225/06517 (2013.01); H01L 2225/0652 (2013.01); H01L 2924/1436 (2013.01); H01L 2924/1437 (2013.01);
Abstract

A method for forming a package structure is provided. The method includes forming a first interconnect structure over a carrier substrate and disposing a first die structure over the first interconnect structure. The method includes forming a dam structure over the first die structure. The method also includes forming a protection layer over a second interconnect structure. The method further includes bonding the second interconnect structure over the dam structure. In addition, the method includes forming a package layer between the first interconnect structure and the second interconnect structure. The method also includes removing the protection layer.


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