The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

Dec. 23, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Kuo-Ming Wu, Zhubei, TW;

Ming-Che Lee, Tainan, TW;

Hau-Yi Hsiao, Chiayi, TW;

Cheng-Hsien Chou, Tainan, TW;

Sheng-Chau Chen, Tainan, TW;

Cheng-Yuan Tsai, Chu-Pei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); H01L 21/268 (2006.01); H01L 21/46 (2006.01); H01L 23/00 (2006.01); H01L 23/31 (2006.01); H01L 23/532 (2006.01); H01L 25/00 (2006.01); H01L 21/304 (2006.01); H01L 21/306 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 25/50 (2013.01); H01L 21/268 (2013.01); H01L 23/3171 (2013.01); H01L 23/3185 (2013.01); H01L 23/5329 (2013.01); H01L 24/94 (2013.01); H01L 21/304 (2013.01); H01L 21/30604 (2013.01); H01L 21/30625 (2013.01); H01L 21/3065 (2013.01); H01L 21/3083 (2013.01); H01L 24/05 (2013.01); H01L 24/08 (2013.01); H01L 2224/0557 (2013.01); H01L 2224/08145 (2013.01); H01L 2224/94 (2013.01);
Abstract

A bonded assembly of a first wafer including a first semiconductor substrate and a second wafer including a second semiconductor substrate may be formed. The second semiconductor substrate may be thinned to a first thickness, and an inter-wafer moat trench may be formed at a periphery of the bonded assembly. A protective material layer may be formed in the inter-wafer moat trench and over the backside surface of the second semiconductor substrate. A peripheral portion of the second semiconductor substrate located outside the inter-wafer moat trench may be removed, and a cylindrical portion of the protective material layer laterally surrounds a remaining portion of the bonded assembly. The second semiconductor substrate may be thinned to a second thickness by performing at least one thinning process while the cylindrical portion of the protective material layer protects the remaining portion of the bonded assembly.


Find Patent Forward Citations

Loading…