The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

May. 11, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Ker-hsun Liao, Hsinchu, TW;

Wei-Ming Wang, Hsinchu, TW;

Yen-Hsing Chen, Hsinchu, TW;

Lun-Kuang Tan, Hsinshu, TW;

Yi Chen Ho, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B08B 9/032 (2006.01); B08B 9/08 (2006.01); B08B 13/00 (2006.01); G05B 13/02 (2006.01); G05D 23/22 (2006.01); H01L 21/02 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); B08B 9/0325 (2013.01); B08B 9/08 (2013.01); B08B 13/00 (2013.01); G05B 13/0265 (2013.01); G05D 23/22 (2013.01); B08B 2209/032 (2013.01); B08B 2209/08 (2013.01); H01L 21/0214 (2013.01); H01L 21/02271 (2013.01); H01L 29/66795 (2013.01);
Abstract

Some implementations described herein provide techniques and apparatuses for determining a performance of a dry-clean operation within a deposition tool. A cleaning-control subsystem of the deposition tool may include a gas concentration sensor and a temperature sensor mounted in an exhaust system of the deposition tool to monitor the dry-clean operation. The gas concentration sensor may provide data related to a concentration of a chemical compound in a cleaning gas, where the chemical compound is a bi-product of the dry-clean operation. The temperature sensor may provide temperature data related to an exothermic reaction of the dry-clean operation. Such data may be used to determine an efficiency and/or an effectiveness of the dry-clean operation within the deposition tool.


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