The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Dec. 10, 2020
Yangtze Memory Technologies Co., Ltd., Wuhan, CN;
YANGTZE MEMORY TECHNOLOGIES CO., LTD., Wuhan, CN;
Abstract
A first opening extending vertically through a dielectric stack is formed above a substrate. The dielectric stack includes vertically interleaved dielectric layers and sacrificial layers. Parts of the sacrificial layers facing the opening are removed to form a plurality of first recesses. A plurality of stop structures are formed along sidewalls of the plurality of first recesses. A plurality of storage structures are formed over the plurality of stop structures in the plurality of first recesses. The plurality of sacrificial layers are removed to expose the plurality of stop structures from a plurality of second recesses opposing the plurality of first recesses. The plurality of stop structures are removed to expose the plurality of storage structures. A plurality of blocking structures are formed over the plurality of storage structures in the plurality of second recesses.