The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Nov. 04, 2020
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Yun-Tai Shih, Changhua, TW;

Ching-Hou Su, Hsinchu, TW;

Chyi-Tsong Ni, Hsinchu, TW;

I-Shi Wang, Taipei, TW;

Jeng-Hao Lin, Chubei, TW;

Kuan-Ming Pan, Hsinchu, TW;

Jui-Mu Cho, Chupei, TW;

Wun-Kai Tsai, Yunlin, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 23/544 (2006.01); H01L 21/68 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 24/75 (2013.01); H01L 21/67092 (2013.01); H01L 21/681 (2013.01); H01L 23/544 (2013.01); H01L 21/68 (2013.01); H01L 21/682 (2013.01); H01L 2223/54426 (2013.01); H01L 2224/75703 (2013.01); H01L 2224/75753 (2013.01); H01L 2224/75901 (2013.01); Y10T 29/49 (2015.01); Y10T 29/49002 (2015.01); Y10T 29/49131 (2015.01); Y10T 29/49764 (2015.01); Y10T 29/53022 (2015.01);
Abstract

A method of aligning two wafers during a bonding process includes aligning a first wafer having a plurality of alignment markings with a second wafer having a plurality of alignment markings. The method further includes placing a plurality of flags between the first wafer and the second wafer. The method further includes detecting movement of the plurality of flags with respect to the first wafer and the second wafer using at least one sensor. The method further includes determining whether the wafers remain aligned within an alignment tolerance based on the detected movement of the plurality of flags relative to the first wafer and the second wafer.


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