The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2023

Filed:

Dec. 26, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Hui-Chi Huang, Zhubei, TW;

Jeng-Chi Lin, Hsinchu, TW;

Pin-Chuan Su, Hsinchu, TW;

Chien-Ming Wang, Tainan, TW;

Kei-Wei Chen, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/04 (2006.01); H01L 21/02 (2006.01); B08B 1/00 (2006.01); B08B 3/08 (2006.01); B08B 5/04 (2006.01); A46B 13/04 (2006.01); B08B 1/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02087 (2013.01); A46B 13/04 (2013.01); B08B 1/002 (2013.01); B08B 1/04 (2013.01); B08B 3/08 (2013.01); B08B 5/04 (2013.01); B08B 7/04 (2013.01); A46B 2200/30 (2013.01);
Abstract

A tool and methods of removing films from bevel regions of wafers are disclosed. The bevel film removal tool includes an inner motor nested within an outer motor and a bevel brush secured to the outer motor. The bevel brush is adjustable radially outward to allow the wafer to be inserted in the bevel brush and to be secured to the inner motor. The bevel brush is adjustable radially inward to engage one or more sections of the bevel brush and to bring the bevel brush in contact with a bevel region of the wafer. Once engaged, a solution may be dispensed at the engaged sections of the bevel brush and the inner motor and the outer motor may be rotated such that the bevel brush is rotated against the wafer such that the bevel films of the wafer are both chemically and mechanically removed.


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