The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2023
Filed:
Nov. 24, 2020
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Hung-Yi Tsai, Zhubei, TW;
Wei-Che Hsieh, Taipei, TW;
Ta-Cheng Lien, Cyonglin Township, TW;
Hsin-Chang Lee, Zhubei, TW;
Ping-Hsun Lin, New Taipei, TW;
Hao-Ping Cheng, Hsinchu, TW;
Ming-Wei Chen, Hsinchu, TW;
Szu-Ping Tsai, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes a base material made of one or more of a Cr based material, an Ir based material, a Pt based material, or Co based material, and further contains one or more additional elements selected from the group consisting of Si, B, Ge, Al, As, Sb, Te, Se and Bi.