The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2023

Filed:

Feb. 14, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Daria Negri, Nesher, IL;

Amnon Manassen, Haifa, IL;

Gilad Laredo, Nesher, IL;

Assignee:

KLA CORPORATION, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/70641 (2013.01); G03F 7/70683 (2013.01); G06T 7/0004 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A system and method of measuring misregistration in the manufacture of semiconductor device wafers is disclosed. A first layer and the second layer are imaged in a first orientation with a misregistration metrology tool employing light having at least one first wavelength that causes images of both the first periodic structure and the second periodic structure to appear in at least two planes that are mutually separated by a perpendicular distance greater than 0.2 μm. The first layer and the second layer are imaged in a second orientation with the misregistration metrology tool employing light having the at least one first wavelength that causes images of both the first periodic structure and the second periodic structure to appear in the at least two planes. At least one parameter of the misregistration metrology tool is adjusted based on the resulting analysis.


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