The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2022
Filed:
Jul. 09, 2021
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Hsin-Feng Chen, Yilan, TW;
Ming-Hsun Tsai, Hsinchu, TW;
Li-Jui Chen, Hsinchu, TW;
Shang-Chieh Chien, New Taipei, TW;
Heng-Hsin Liu, New Taipei, TW;
Cheng-Hao Lai, Taichung, TW;
Yu-Huan Chen, Hsinchu, TW;
Wei-Shin Cheng, Hsinchu, TW;
Yu-Kuang Sun, Hsinchu, TW;
Cheng-Hsuan Wu, New Taipei, TW;
Yu-Fa Lo, Kaohsiung, TW;
Chiao-Hua Cheng, Tainan, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Abstract
A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.