The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Nov. 26, 2019
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Fu-Tsun Tsai, Tainan, TW;

Tong Jun Huang, Hsinchu, TW;

I-Chih Chen, Tainan, TW;

Chi-Cherng Jeng, Tainan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01); H01L 29/78 (2006.01); H01L 29/08 (2006.01); H01L 27/092 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 29/165 (2006.01); H01L 21/8234 (2006.01); H01L 21/311 (2006.01); H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66795 (2013.01); H01L 21/02532 (2013.01); H01L 21/02617 (2013.01); H01L 21/311 (2013.01); H01L 21/823431 (2013.01); H01L 21/823821 (2013.01); H01L 27/0886 (2013.01); H01L 27/0924 (2013.01); H01L 29/0847 (2013.01); H01L 29/165 (2013.01); H01L 29/7853 (2013.01);
Abstract

A semiconductor device includes a substrate, a first fin extending from the substrate, a first gate structure over the substrate and engaging the first fin, and a first epitaxial feature partially embedded in the first fin and raised above a top surface of the first fin. The semiconductor device further includes a second fin extending from the substrate, a second gate structure over the substrate and engaging the second fin, and a second epitaxial feature partially embedded in the second fin and raised above a top surface of the second fin. A first depth of the first epitaxial feature embedded into the first fin is smaller than a second depth of the second epitaxial feature embedded into the second fin.


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