The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Aug. 27, 2021
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Yu-Kuang Sun, Hsinchu, TW;
Ming-Hsun Tsai, Hsinchu, TW;
Yu-Huan Chen, Hsinchu, TW;
Wei-Shin Cheng, Hsinchu, TW;
Cheng-Hao Lai, Hsinchu, TW;
Hsin-Feng Chen, Hsinchu, TW;
Chiao-Hua Cheng, Hsinchu, TW;
Cheng-Hsuan Wu, Hsinchu, TW;
Yu-Fa Lo, Hsinchu, TW;
Shang-Chieh Chien, Hsinchu, TW;
Li-Jui Chen, Hsinchu, TW;
Heng-Hsin Liu, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become energized and emit extreme ultraviolet radiation. A collector reflects the extreme ultraviolet radiation toward a photolithography target. The photolithography system isolates a source of droplets from oxidants to prevent the oxidation of the nozzle or the formation of metal oxides on the nozzle, both of which can adversely affect an ability of the nozzle to generate a sufficient amount of droplets and/or direct the droplets in a desired direction.