The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2022
Filed:
Oct. 02, 2020
Asml Netherlands B.v., Veldhoven, NL;
Emil Peter Schmitt-Weaver, Eindhoven, NL;
Kaustuve Bhattacharyya, Veldhoven, NL;
Wim Tjibbo Tel, Helmond, NL;
Frank Staals, Eindhoven, NL;
Leon Martin Levasier, Hedel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.