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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11360392 B1

PDFFull Text
Date of Patent:
Jun. 14, 2022

Filed:

Jun. 03, 2020

Photolithography device having illuminator and method for adjusting intensity uniformity

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Che-Chang Hsu, Taichung, TW;

Chieh-Jen Cheng, Hsinchu, TW;

Li-Jui Chen, Hsinchu, TW;

Shang-Chieh Chien, New Taipei, TW;

Chao-Chen Chang, Taipei, TW;

Ssu-Yu Chen, New Taipei, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Attorney:

JCIPRNET

Primary Examiner:

Christina A Riddle

Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70075 (2013.01); G03F 7/702 (2013.01); G03F 7/70033 (2013.01); G03F 7/70116 (2013.01); G03F 7/70191 (2013.01); G03F 7/70916 (2013.01); H01L 21/0274 (2013.01);
Abstract

An illuminator includes a first facet mirror receiving and reflecting an exposure radiation, an adjustable shielding element disposed on the first facet mirror, the adjustable shielding element adjusting intensity uniformity of the exposure radiation reflected by the first facet mirror, and a second facet mirror receiving and reflecting the exposure radiation reflected by the first facet mirror.

Find Patent Forward Citations

Hsu, Che-Chang. (2022). Photolithography device having illuminator and method for adjusting intensity uniformity (U.S. Patent No. 11360392). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11360392

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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