The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2021

Filed:

Oct. 18, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Meng-Ku Chen, New Taipei, TW;

Chii-Horng Li, Zhubei, TW;

Cheng-Po Chau, Tainan, TW;

Pei-Ren Jeng, Chu-Bei, TW;

Yee-Chia Yeo, Hsinchu, TW;

Chia-Ao Chang, Jinhu Township, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 21/28 (2006.01); H01L 21/285 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66545 (2013.01); H01L 21/28556 (2013.01); H01L 21/76224 (2013.01);
Abstract

An improved dummy gate and a method of forming the same are disclosed. In an embodiment, the method includes depositing a first material in a trench, the trench being disposed between a first fin and a second fin; etching the first material to expose an upper portion of sidewalls of the trench; and depositing a second material on the first material without the second material being deposited on the exposed upper portion of the sidewalls of the trench.


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