The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Sep. 25, 2018
Applicant:
Versum Materials Us, Llc, Tempe, AZ (US);
Inventors:
Jhih Kuei Ge, Chupei, TW;
Yi-Chia Lee, Danshu, TW;
Wen Dar Liu, Chupei, TW;
Tianniu Rick Chen, Chupei, TW;
Assignee:
Versum Materials US, LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 11/00 (2006.01); C11D 7/50 (2006.01); C11D 7/26 (2006.01); C11D 7/34 (2006.01); C11D 3/43 (2006.01); C11D 1/40 (2006.01); H01L 21/02 (2006.01); C11D 3/20 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); C11D 1/40 (2013.01); C11D 3/43 (2013.01); C11D 7/265 (2013.01); C11D 7/3209 (2013.01); C11D 7/34 (2013.01); C11D 7/5022 (2013.01); C11D 3/2068 (2013.01); H01L 21/02057 (2013.01);
Abstract
Described herein is an aqueous composition for treating a substrate including patterns having line-space dimensions of 50 nm or below to prevent collapse of the patters, the composition comprising: a solvent system comprising water and a water-miscible organic solvent; a surface modifier that is a reaction product between an alkylamine and an organic acid; and an optional pH adjusting agent.