The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2021
Filed:
Dec. 30, 2016
Applicant:
Intel Corporation, Santa Clara, CA (US);
Inventors:
Manish Chandhok, Beaverton, OR (US);
Satyarth Suri, Portland, OR (US);
Tristan A. Tronic, Aloha, OR (US);
Christopher J. Jezewski, Portland, OR (US);
Richard E. Schenker, Portland, OR (US);
Assignee:
INTEL CORPORATION, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76831 (2013.01); H01L 21/76802 (2013.01); H01L 21/76843 (2013.01); H01L 21/76883 (2013.01); H01L 21/76888 (2013.01); H01L 21/76897 (2013.01); H01L 23/5226 (2013.01); H01L 21/02252 (2013.01);
Abstract
In one embodiment, a trench may be formed in a dielectric surface, and the trenched may be lined with a liner. The trench may be filled with a metal, and the metal may be recessed below an opening of the trench. The liner may be converted into a dielectric, and a hard mask may be deposited into the trench.